In 2000 Mattson Technology Inc. started a joined development program together with IMEC.
The goal of this program was to proove the process capabilities of Mattson's new Aspen III Highland reactor as a strrip and etch tool in Low-K back end of line applications.
At this moment the processes developed on the Aspen III Highland tool have already shown there compatibility with following Low-k materials in single and dual damascene structures:
SiLK and p-SiLK
XLK
LKD
Black Diamond
Aurora
Trikon
Some results of the work performed in this joined development program have been presented in this year's U.C.P.S.S. conference.
The abstract of the published paper can be found here
The abstracts of all other papers on the conference can be found on U.C.P.S.S. website.
http://sst.pennnet.com/Search/index.cfm
http://www.e-insite.net/electronicnews/
12/30/2002